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Plasma chemical deposition of thin fluorocarbone films
Veverková, Radka ; Přikryl, Radek (referee) ; Krčma, František (advisor)
Deposition of thin films is one of the most widespread applications used for the changes of surface properties of various materials. This diploma thesis is focused on diagnosing of thin film generated by a PECVD technique. The capacitively coupled RF discharge at low pressure was used for the thin films deposition using tetrafluoromethane (CF4) with addition of hydrogen (H2) as a precursor. The aim of the work was the search of optimal conditions for a hydrophobic thin layer preparation on the surface of polymer NOA. The depositions were performed in continuous and pulsed mode with different duty cycle. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry. Thin films structure and properties were characterized using water contact angle measurements, X-ray photoelectron spectroscopy, infrared spectroscopy and optical ellipsometry. The influence of varying power, gas mixture composition and discharge mode were investigated. Water contact angle was the highest for a deposition in a continuous mode. Decomposition processes inside the reactor were observed by using mass spectrometry and optical emission spektrokopie. X-ray photoelectron spectroscopy provided information about the chemical bonds represented on the surface of sample. These were mainly C – C/C – H, C – O, O = C - O groups for sample without layer. Other chemical bonds were observed after the deposition. These were mainly C – CF, CF2 and CF3 groups. The film thickness of about 8,2 nanometers was measured by optical ellipsometry. The obtained results may be used as a fundament for further more advanced study of plasma chemically prepared thin fluorocarbon films and their properties.
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Plasma chemical deposition of thin fluorocarbone films
Veverková, Radka ; Přikryl, Radek (referee) ; Krčma, František (advisor)
Deposition of thin films is one of the most widespread applications used for the changes of surface properties of various materials. This diploma thesis is focused on diagnosing of thin film generated by a PECVD technique. The capacitively coupled RF discharge at low pressure was used for the thin films deposition using tetrafluoromethane (CF4) with addition of hydrogen (H2) as a precursor. The aim of the work was the search of optimal conditions for a hydrophobic thin layer preparation on the surface of polymer NOA. The depositions were performed in continuous and pulsed mode with different duty cycle. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry. Thin films structure and properties were characterized using water contact angle measurements, X-ray photoelectron spectroscopy, infrared spectroscopy and optical ellipsometry. The influence of varying power, gas mixture composition and discharge mode were investigated. Water contact angle was the highest for a deposition in a continuous mode. Decomposition processes inside the reactor were observed by using mass spectrometry and optical emission spektrokopie. X-ray photoelectron spectroscopy provided information about the chemical bonds represented on the surface of sample. These were mainly C – C/C – H, C – O, O = C - O groups for sample without layer. Other chemical bonds were observed after the deposition. These were mainly C – CF, CF2 and CF3 groups. The film thickness of about 8,2 nanometers was measured by optical ellipsometry. The obtained results may be used as a fundament for further more advanced study of plasma chemically prepared thin fluorocarbon films and their properties.
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